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The topography of lithography

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Have just loaded two features onto the site - Why design engineers need to know about lithography, part 1 and
part 2. Check out this tracing of the topography of lithography, as it were.

Part one considers how semiconductor manufacturers have moved to lasers with ever smaller wavelengths (from 436 nm in 1980, to 365 nm in 1988, to 350 nm in 1994, to 248 nm in 1998 and finally to 193 nm in 2001) up to the 248-nm generation of lithography tools, when people began patterning below the wavelength of the light source.

Part two - looking past "the lithography bottleneck" towards 16 nanometre process technology - covers double patterning resolution enhancement techniques, Synopsys' PrimeYield tool and virtual manufacturing environments.

Bookmark these URLs for future reference!

Why design engineers need to know about lithography [part 1]

Why design engineers need to know about lithography [part 2]

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This page contains a single entry from the blog posted on November 26, 2007 5:15 PM.

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