Bell Labs Advances Process Technology
‘A major advance in the fabrication of integrated circuits has been achieved by Bell Telephone Laboratories by the development of an Electron Beam Exposure System, known as EBES.’
So starts a story in the October 8th 1975 edition of Electronics Weekly.
The story continues:
‘By using a beam of electrons to generate the microscopic patterns from which integrated circuits are manufactured, EBES can produce master pattern masks faster, more reliably, with fewer defects, and at lower cost than masks made by existing photographic systems.’
The story concludes:
‘”Pattern generation is one of the important limiting factors in circuit technology, but EBES makes possible the routine production of master masks of a quality that was previously possible only at great expense”, said Eugene Gordon, director of the Pattern Generation Laboratory at Bell Laboratories, Murray Hill, New Jersey facility.’