mannerisms

Ruminations on the electronics industry from David Manners, Senior Components Editor on Electronics Weekly.

IBM-ASML Achieve 44W EUV Light Source

An upgrade to the light source of ASML’s EUV scanner at IBM’s EUV Centre of Excellence in Albany has achieved power of 44W allowing the processing of 637 wafers in 24 hours – about 26 wafers per hour.

The 44W light source is a substantial increase in performance for its supplier – Cymer of San Diego which ASML bought last year.

However it is a long way short of what is needed for a production tool. 125W is needed for a tool able to produce 60 wafers per hour and 250W is needed to make 120 wafers an hour – the throughput required for a volume production tool.

The other producer of light sources, Japan’s Gigaphoton, says it has developed a 92W EUV light source.

Without EUV the only option will be double, triple or quadruple patterning which will increase the cost of chips.

Scaling no longer increases performance or reduces power so, it is no longer able to reduce cost, it will lose its point.

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2 Comments

  1. david manners
    July 30, 2014 16:24

    Maybe I should have said thst scaling, meaning shrinking, of itself doesn’t increase performance or reduce power, Mike, it’s the use of new materials (high k, hafnium etc), new transistor structures (finfet, FDSOI), multiple process tweaks, lower voltages and design innovation (multi-core and turning stuff off) which have combined to keep performance increasing without power increasing. In the old days you made the transistors smaller and everything else followed. Nowadays it doesn’t.

  2. Mike Bryant
    July 30, 2014 15:15

    “Scaling no longer increases performance or reduces power so, it is no longer able to reduce cost, it will lose its point.”

    I think you’ve been on the amber nectar David. Scaling most definitely still increases performance and reduces power, but I agree using current processing techniques doesn’t reduce cost at the current nodes.

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