IBM-ASML Achieve 44W EUV Light Source
An upgrade to the light source of ASML’s EUV scanner at IBM’s EUV Centre of Excellence in Albany has achieved power of 44W allowing the processing of 637 wafers in 24 hours – about 26 wafers per hour.
The 44W light source is a substantial increase in performance for its supplier – Cymer of San Diego which ASML bought last year.
However it is a long way short of what is needed for a production tool. 125W is needed for a tool able to produce 60 wafers per hour and 250W is needed to make 120 wafers an hour – the throughput required for a volume production tool.
The other producer of light sources, Japan’s Gigaphoton, says it has developed a 92W EUV light source.
Without EUV the only option will be double, triple or quadruple patterning which will increase the cost of chips.
Scaling no longer increases performance or reduces power so, it is no longer able to reduce cost, it will lose its point.