Tech news tagged ‘lithography’

EUV achieves 1000 wpd with 90W source

TSMC told the SPIE Lithography conference that it has exposed 1,022 wafers in 24 hours with an ASML NXE:3300B EUV machine with a  source power of 90W and that it has achieved several 400+ wafer per day results…

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IMEC: Scaling beyond 15nm

Belgian lab IMEC was founded on semiconductor process research, and has grown into one of the two organisations in the world that companies partner with for advanced process research. The other is IBM. TSMC partners IMEC for advanced CMOS, as does Intel and almost everyone else. The notable exception is…

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Brighter EUV source for lithography

Nuclear fusion research at the University of Washington has lead to a source of extreme ultra-violet (EUV) for lithography. EUV lithography at 13.5nm is one of the techniques proposed to continue ‘Moore’s Law’ below 10nm, replacing 193nm light laser light. However, EUV sources are exotic – one, for…

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E-beam production comes out of the shadows

Lithography gloom lifted a little as electron beam production lithography demonstrated 22nm dense lines and spaces and 22nm dense contact holes using positive chemically-amplified resist. “This demonstrated resolution also meets the industry requirement for the next-generation 14nm and 10nm logic technology nodes,” claimed French research lab CEA-Leti…

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PragmatIC scales towards imprint lithography in the UK

Imprinted organic circuit firm PragmatIC Printing is moving to pilot production; at PETeC, the UK’s printable electronics development centre in Sedgefield.

“As well as supporting commercial production for low volume applications, the pilot line also provides a platform for the collaborative PragmatIC Pilot Production Program [P4],” said PragmatIC.

P4…

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IMEC: EUV for 16nm production in 2013

Extreme UV lithography has taken another step forwards with Belgian research lab IMEC producing the first wafers on the NXE:3100 pre-production scanner from Dutch equipment maker ASML. “We are convinced that our program will bring significant contributions to bringing EUV to mass manufacturing for the 16nm node by…

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Greetings card gets plastic electronics

Cambridge-based plastic electronics firm PragmatIC has delivered a prototype greeting card to Hallmark subsidiary Tigerprint. On a plastic substrate, the card’s electronics are formed by imprint lithography – pressing sub-micron features with a physical mould – rather than printing. The firm’s imprinted sub-micron intellectual property for producing…

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ST, CMP make 28nm available for MPW.

STMicroelectronics and the multi-project wafer organisation CMP (Circuits Multi Projets) have announced that the CMOS 28nm process from STMicroelectronics is now available for prototyping to universities, research labs and companies through the silicon brokerage services provided by CMP.

 
The introduction of the 28nm CMOS process builds on the…

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EU funds 32nm EDA tools

The EU is funding a European consortium to improve sub-wavelength lithography and associated EDA tools. The aim is to find a way past the current choice at 32nm and below between computationally intensive layout tools that achieve high gate density, and restricted tools that cost less to use but…

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