Posts Tagged ‘lithography’
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PragmatIC to qualify flexible transistor process

PragmatIC and Netherlands research lab Holst Centre will jointly develop qualified processes and materials for the Cambridge firm’s imprint lithograph process – which forms micron-scale organic transistors on polymer substrates using force rather than light. “It will make the technology readily accessible to Holst Centre programme partners and other…

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UMC Q3 profit up 24%

UMC, the No.3 foundry, saw Q3 profits up 24% y-o-y at $83m while revenues rose 13% to $975m. Capacity utilisation was 84%. “Increased 40nm revenue contribution led to higher ASP, which contributed to 3Q revenue growth,” says Dr. Shih-Wei Sun, CEO of UMC, “with the share…

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IMEC: Scaling beyond 15nm

Belgian lab IMEC was founded on semiconductor process research, and has grown into one of the two organisations in the world that companies partner with for advanced process research. The other is IBM. TSMC partners IMEC for advanced CMOS, as does Intel and almost everyone else. The notable exception is…

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Ho Chi Minh City plans fab

The Vietnam government is planning to set up a fab, following the establishment of a programme called ‘Development of the IC industry of Ho Chi Minh City.’

The programme envisions founding chip company start-up incubators, design and prototyping facilities and a fab.

By 2017, the programme expects to have…

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Brighter EUV source for lithography

Nuclear fusion research at the University of Washington has lead to a source of extreme ultra-violet (EUV) for lithography. EUV lithography at 13.5nm is one of the techniques proposed to continue ‘Moore’s Law’ below 10nm, replacing 193nm light laser light. However, EUV sources are exotic – one, for…

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E-beam production comes out of the shadows

Lithography gloom lifted a little as electron beam production lithography demonstrated 22nm dense lines and spaces and 22nm dense contact holes using positive chemically-amplified resist. “This demonstrated resolution also meets the industry requirement for the next-generation 14nm and 10nm logic technology nodes,” claimed French research lab CEA-Leti…

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PragmatIC scales towards imprint lithography in the UK

Imprinted organic circuit firm PragmatIC Printing is moving to pilot production; at PETeC, the UK’s printable electronics development centre in Sedgefield. “As well as supporting commercial production for low volume applications, the pilot line also provides a platform for the collaborative PragmatIC Pilot Production Program [P4],” said PragmatIC. P4…

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UK imprinted electronics prototypes light up

UK imprint lithography start-up PragmatIC has tied up with paper firm De La Rue to develop printed electronic security products. The £600,000 project is called RAIL (remotely activated interactive labels) and is partly supported by the Government’s Technology Strategy Board. “PragmatIC and De La Rue have completed…

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IMEC: EUV for 16nm production in 2013

Extreme UV lithography has taken another step forwards with Belgian research lab IMEC producing the first wafers on the NXE:3100 pre-production scanner from Dutch equipment maker ASML. “We are convinced that our program will bring significant contributions to bringing EUV to mass manufacturing for the 16nm node by…

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